ENHANCED CAPABILITIES
- Semi-automatic controllable cleaving process for visible and buried defects
- Observation from top and bottom sides of the sample
- Registration and cross-section of buried defects
- Advanced white light and IR optics
FEATURES
- Accuracy better than 5 microns, mostly 2-3 microns
- Process time – single minute
- Small input sample or die – down to 4×2 mm
- Cleaving as close as 2 mm to the wafer or die edge
- Continuous cleaving of multiple targets
- Advanced optics with variable magnification up to 1000x
- Software controllable cleaving process
- Built-in vacuum
- “Maintenance free” servicing model
BENEFITS
- Turnaround time significantly reduced
- Improves yield analysis
- Improves characterization
- Improves and enhances SEM and FIN utilization
- Low cost of ownership
For additional information about SELA products please, contact us