FEATURES
- Semi-automatic controllable cleaving process
 - Accuracy better than 5 microns, mostly 2-3 microns
 - Process time – single minute
 - Extremally small input sample or die – down to 1×1 mm
 - Cleaving as close as 1 mm to the wafer or die edge
 - Continuous cleaving of multiple targets
 - Advanced optics with variable magnification up to 1000x
 - Software controllable cleaving process
 - Built-in vacuum
 - “Maintenance free” servicing model
 
BENEFITS
- Turnaround time significantly reduced
 - Improves yield analysis
 - Improves characterization
 - Improves and enhances SEM and FIN utilization
 - Low cost of ownership
 
For additional information about SELA products please, contact us














 